The Nova i500 is a high-end integrated metrology system designed to work with fast throughput process tools in production environments. With a unique and robust optical design, the i500 offers a highly accurate spectra collection in a very short time. The advanced i500 metrology system provides superior precision, reliability and the highest level of tool-to-tool matching.
Working in conjunction with the NovaMARS® software application development platform, the Nova i500 platform delivers process control for 1x nm applications using polarized DUV. The system utilizes Nova Spectral Reflectometry technology to measure CD and Depth on complex structures.
As the complexity of 2D/3D structures increases, a high sampling rate is becoming imperative to ensure the manufacturing quality and process control. The Nova i500 is the only tool in the market that can support the fast production pace while measuring 100% of the wafer within the process tool.
Highest throughput solution applications
HKMG, STI, Cu and W
Qualified for fast polishers
Wide polarized spectral range