Metrology is widely used in semiconductor process development and manufacturing in integrated or stand-alone modes. As device complexity increases, the process development becomes highly challenging and requires frequent changes to structures and metrology requirements.
Metrology measures embedded details and critical profile parameters of complex 3D device structures in semiconductor manufacturing. It reliably provides the precise measurements required for ensuring tight process control and increased yields.
In order to deliver an effective and efficient metrology solution for semiconductor manufacturing you need a robust optical platform, advanced metrology IP and a powerful the computational infrastructure.
The dynamic nature of the semiconductor industry makes process development efficiency imperative in order to increase yield and stay ahead of the competition. The metrology solution must combine ease and speed of development.
With shrinking device sizes and increasing structure complexity, the demands for advanced metrology are continuously on-the-rise. These process control solutions need to effectively address the most advanced and complex requirements of 3D structures and state-of-the art manufacturing processes.
Over the years, Nova has continually invested in the development of a powerful, flexible yet user friendly metrology modeling engine; the NovaMARS software platform. This focus on building a software infrastructure and algorithmic development has enabled Nova to partner with semiconductor manufacturers in new application development. This technology base is effectively used to launch metrology solutions for new market innovations like through-silicon-via (TSV) very quickly.
To accelerate the computationally intensive process development, Nova HPC, high performance computing platform is provided. The solution combines a scalable, user-configurable infrastructure with Nova’s proprietary task management software designed to address the increasing complexity of IC manufacturing processes in an efficient way.
Nova’s holistic, multi-faceted approach to metrology produces detailed reproduction of complex 3D structures by extracting fine shape parameters. As a result, complex technology node manufacturers achieve the desired level of process control in fabrication of advanced devices.
Hybrid Metrology is the practice of combining measurements from multiple equipment types or toolsets.
NovaMARS proprietary algorithms enables the exchange of data from one tool set with another toolset and used in a complementary or synergistic way to enable or improve the measurement of one or more critical parameters.
First phase of the implementation of the Hybrid solution is released through the communication with the FAB host for the transfer of data.
- Data from the secondary tool will be transferred to the primary tool via host befor job process
For further information please see our Technical Publications page.