Technical publications

2013

The Enabling Role of Metrology in the 450 mm Transition

Apr. 25, 2013

Author(s): Rand Cottle, David Nessim, Frank Robertson, Menachem Shoval.

Future Fab International fully digital journal. Issue 45.

Download

2013

Implementation of Hybrid Metrology at HVM Fab for 20nm and beyond

Apr. 18, 2013

Author(s): Alok Vaid, Lokesh Subramanya, Givantha Iddawelaa, Carl Forda, John Allgaira, Gaurav Agrawala, John Taylora,Carsten Hartigb, Byung Cheol (Charles) Kangc, Cornel Bozdogc, Matthew Sendelbachc, Paul Isbesterc, Limor Issascharoffd. GLOBALFOUNDRIES, Nova Measuring Instruments, Inc. Nova Measuring Instruments,LTD.

Metrology, Inspection, and Process Control for Microlithography XXVII, edited by Alexander Starikov, Jason P. Cain, Proc. of SPIE Vol. 8681, 868103 · © 2013 SPIE · CCC code: 0277-786X/13/$18 · doi: 10.1117/12.2012339

Download

2013

Application of Optical CD metrology for alternative lithography

Apr. 10, 2013

Author(s): Masafumi Asano, Akiko Kawamoto, Kazuto Matsuki, Stephane Godny, Tingsheng Lin, Koichi Wakamoto.Center for Semiconductor Research and Development, Toshiba Corporation, Nova Measuring Instruments Ltd.

Metrology, Inspection, and Process Control for Microlithography XXVII, edited by Alexander Starikov, Jason P. Cain, Proc. of SPIE Vol. 8681, 86812C · © 2013 SPIE · CCC code: 0277-786X/13/$18 · doi: 10.1117/12.2010887

Download

2012

Hybrid metrology solution for 1X node technology

Nov. 13, 2012

Author(s): Alok Vaid ; Alexander Elia ; Mark Kelling ; John Allgair ; Carsten Hartig ; Peter Ebersbach ; Erin McLellan ; Matthew Sendelbach ; Nedal Saleh ; Narender Rana ; Hiroki Kawada ; Toru Ikegami ; Masahiko Ikeno ; Takahiro Kawasaki ; Cornel Bozdog ; Helen Kim ; Elad Arnon ; Roy Koret ; Igor Turovets.

SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 832404 (March 29, 2012); DOI: 10.1117/12.916940

Download

2012

Copper CMP APC for 32nm & 22nm nodes using integrated metrology

Oct. 16, 2012

Author(s): Lin Yang, Wei-Tsu Tseng, Laertis Economikos, Adam Ticknor, Jennifer Muncy, and Xiaomeng Chen Naren Yellai, Hyang Kyun Kim, Marjorie Cheng, Nelson Sivers, Cornel Bozdog, Michael Sendler.

ISSM2012 : IBM Semiconductor R&D Center, 2070 Route 52, Hopewell Junction, NY 12533, USA 2 Nova Measuring Instruments, 2055 Gateway Place, Suite 470, San Jose, CA 95110, USA

Download

2012

Novel method for TSV profile metrology using spectral reflectometry

Jul. 11, 2012

Author(s): Troy Graves-Abe, Chris Collins, Daniel Moore, Mukta Farooq, Robert Hannon (IBM). Gilad Barak, Elad Dotan, Avraham Aloni, Alon Belleli, Michael Rybski (Nova). Joe Petrucci (Lam Research).

Download

2011

Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope

Dec. 15, 2011

Author(s): Alok Vaid ; Bin Bin Yan ; Yun Tao Jiang ; Mark Kelling ; Carsten Hartig ; John Allgair ; Peter Ebersbach ; Matthew Sendelbach ; Narender Rana ; Ahmad Katnani ; Erin Mclellan ; Charles Archie ; Cornel Bozdog ; Helen Kim ; Michael Sendler ; Susan Ng ; Boris Sherman ; Boaz Brill ; Igor Turovets ; Ronen Urensky. GLOBALFOUNDRIES, IBM Corporation, Nova Measuring Instruments, Inc,

J. Micro/Nanolith. MEMS MOEMS 043016-1 doi:10.1117/1.3655726

Download

2011

A holistic metrology approach: multi-channel scatterometry for complex applications

Apr. 20, 2011

Author(s): Cornel Bozdog, Hyang Kyun (Helen) Kim, Susan Emans Nova Measuring Instruments, Inc., 4701 Patrick Henry Dr, Suite 1701, Santa Clara CA 95054, USA Boris Sherman, Igor Turovets, Ronen Urenski, Boaz Brill Nova Measuring Instruments, LTD, P.O. Box 266, Weizmann Science Park, Rehovot 76100, Israel Alok Vaid GLOBALFOUNDRIES, 2070 Route 52, Hopewell Jct NY 12533, USA Matthew Sendelbach IBM Corporation, 2070 Route 52, Hopewell Jct NY 12533, USA

Download

2011

Hybrid metrology for advanced semiconductor fabrication

Mar. 22, 2011

Author(s): Alok Vaid, Narender Rana,Cornel Bozdog.

Download

2011

Hybrid metrology utilizing scatterometry, CD-AFM and CD-SEM

Feb. 28, 2011

Author(s): Alok Vaid, Bin Bin Yan, Carsten Hartig, John Allgair, Mark Kelling, Peter Ebersbach, Yun Tao Jiang GLOBALFOUNDRIES, Inc. Matthew Sendelbach, Narender Rana, Ahmad Katnani, Erin Mclellan, Charles Archie - IBM Corporation Cornel Bozdog, Helen Kim, Michael Sendler, Boaz Brill, Susan Ng, Boris Sherman, Igor Turovets, Ronen Urensky Nova Measuring Instruments, Inc.

Download

2010

Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings

Apr. 01, 2010

Author(s): Alok Vaid ; Matthew Sendelbach ; Daniel Moore ; Timothy Brunner ; Nelson Felix ; Pawan Rawat ; Cornel Bozdog ; Helen Kim ; Michael Sendler ; Stanislav Stepanov ; Victor Kucerov.

Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76381H (April 01, 2010); doi:10.1117/12.846648

Download

2009

Product-driven material characterization for improved scatterometry time-to-solution

Mar. 23, 2009

Author(s): Alok Vaid ; Carsten Hartig ; Matthew Sendelbach ; Cornel Bozdog ; Hyang Kyun Kim ; Michael Sendler ; Yoel Cohen ; Victor Kucherov ; Boaz Brill ; Stanislav Stepanov.

Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720V (March 23, 2009); doi:10.1117/12.814380

Download

2008

Scatterometry as technology enabler for embedded SiGe process

Mar. 20, 2008

Author(s): Alok Vaid ; Rohit Pal ; Matthew Sendelbach ; Shahin Zangooie ; Kevin Lensing ; Carsten Hartig.

Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69220U (March 22, 2008); doi:10.1117/12.774564

Download

* Copyright 2012 Society of Photo Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

There Was Problem With The Sending Process

Thank you. Your message has been sent

Sending Your Request, Please Wait